Title :
2.1: Field electron emission properties of n-type single crystal cubic boron nitride
Author :
Yamada, Takatoshi ; Nebel, Christoph E. ; Taniguchi, Takashi
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
Abstract :
We will report on the field emission properties of single crystal n-type cubic boron nitride (c-BN) for the first time. Vacuum annealed positive electron affinity (PEA) surface shows lower threshold voltages compared to H-terminated negative electron affinity (NEA) surface. An internal barrier height of c-BN surface with NEA was estimated to be 3.5 eV according to the Schottky barrier lowering model, which prevents electrons from approaching to the emitting surface. A higher electric field is required to reduce the internal barrier for emitting electrons compared to a small PEA surface. From the Fowler-Nordheim plots, the PEA was calculated to be about 0.6 eV, which dominates the electron emission from the vacuum annealed surface.
Keywords :
Schottky barriers; annealing; boron compounds; electron emission; field emission; H-terminated negative electron affinity; Schottky barrier lowering model; field electron emission properties; n-type single crystal cubic boron nitride; positive electron affinity; vacuum annealed; Annealing; Boron; Crystals; Diamond-like carbon; Surface reconstruction; Surface treatment; Threshold voltage; boron nitride; negative electron affinity; surface bend bending; surface modification;
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location :
Palo Alto, CA
Print_ISBN :
978-1-4244-7889-7
Electronic_ISBN :
978-1-4244-7888-0
DOI :
10.1109/IVNC.2010.5563226