DocumentCode
1923979
Title
Microwave Performance of HFETs on Metamorphic In0.7 Al0.3 As/In0.8 Ga0.2 As on GaAs Substrates
Author
Karlsson, Christer ; Rorsman, Niklas ; Wang, Shumin ; Olsson, Eva ; Andersson, Thorvald G. ; Zirath, Herbert
Author_Institution
Department of Microwave Technology,Chalmers University of Technology S-412 96 Göteborg Sweden
fYear
1996
fDate
9-11 Sept. 1996
Firstpage
881
Lastpage
884
Abstract
Heterostructure Field-Effect Transistors (HFETs) on In0.7 Al0.3 As/ In0.8 Ga0.2 As heterostructures grown on GaAs substrates have been fabricated and characterized. The lattice mismatch is accommodated by a linearly graded Inx Aly Ga1-x-y As buffer. The Hall mobility is 9700 and 39400 cm2/Vs at room temperature and 77 K, respectively. An intrinsic transit frequency, fT , of 250 GHz indicates high electron velocity in the In0.8 Ga0.2 As channel. This is, to our knowledge, the highest fT obtained for an Inx Ga1-x As HFET with x≫0.5 on GaAs substrates.
Keywords
Atomic force microscopy; Gallium arsenide; HEMTs; Hall effect; Lattices; MODFETs; Microwave technology; Substrates; Temperature; Transmission electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Conference_Location
Bologna, Italy
Print_ISBN
286332196X
Type
conf
Filename
5435944
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