Title :
Two-dimensional light force lithography with polarization gradient fields
Author :
Brezger, B. ; Schmidt, P.O. ; Schulze, Th. ; Bell, Andrew ; Pfau, Timo ; Mlynek, Jaroslav
Author_Institution :
Konstanz Univ., Germany
Abstract :
Summary form only given.Using neutral atoms for lithography is a new method of generating nanostructures on a substrate. This method is based on light masks formed by interfering laser beams perpendicular to the atomic beam. One- and two-dimensional periodic structures have been fabricated by various groups using light masks with intensity gradients and uniform polarization. The resulting periods are half the laser wavelength or greater. Atoms with a magnetic substructure in the electronic ground state are strongly sensitive to light polarization and static magnetic fields. Our work presents a detailed investigation of possible two-dimensional light field configurations including polarization gradients and static magnetic fields. The resulting nanostructures obtained in an experimentally realistic situation are simulated.
Keywords :
ground states; laser cooling; light polarisation; lithography; masks; nanotechnology; optical pumping; quantum optics; radiation pressure; 2D light field configurations; 2D light force lithography; dressed states; electronic ground state; interfering laser beams; laser cooling; light masks; magnetic substructure; multilevel atom; nanostructures generation; neutral atoms use; optical pumping; perpendicular to atomic beam; polarization gradient fields; spontaneous emission recoil; static magnetic fields; Atom lasers; Atomic beams; Chromium; Laser beams; Lattices; Lithography; Magnetic fields; Magnetic separation; Nanostructures; Optical polarization;
Conference_Titel :
Quantum Electronics Conference, 1998. IQEC 98. Technical Digest. Summaries of papers presented at the International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-541-2
DOI :
10.1109/IQEC.1998.680135