Technology of silicon nano- and microelectrode arrays for pollution control

Author

Kleps, Kina ; Angelescu, Anca ; Miu, Mihaela ; Avram, Marioara ; Simion, Monica

Author_Institution

Nat. Inst. for Res. & Dev. in Microtechnologies (IMT), Bucharest, Romania

Volume

1

fYear

2001

fDate

2001

Firstpage

39

Abstract

A very simple fabrication technology for a new electrode array architecture with metal/dielectric pyramidal nanostructures and disk microstructures on silicon is described. This working electrode is intended for measurements and detection of metallic traces in liquid media

Keywords

arrays; electrochemical electrodes; electrochemical sensors; elemental semiconductors; etching; microelectrodes; micromachining; microsensors; nanotechnology; oxidation; photolithography; silicon; voltammetry (chemical analysis); water pollution measurement; Si; aqueous media; chemical sensor elements; cyclic voltammetry; disk microstructures; metal/dielectric pyramidal nanostructures; metallic film deposition; metallic traces detection; microelectrode arrays; nanoelectrode array; optimum support oxide thickness; photolithographic process; pollution control; silicon etching; simple fabrication technology; steady-state limiting current; thermal oxidation; toxic heavy metals; ultramicroelectrodes; Chemical sensors; Chemical technology; Electrodes; Etching; Fabrication; Microelectrodes; Nanostructures; Pollution control; Silicon; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2001. CAS 2001 Proceedings. International

Conference_Location

Sinaia

Print_ISBN

0-7803-6666-2

Type

conf

DOI

10.1109/SMICND.2001.967413

Filename

967413