• DocumentCode
    1935634
  • Title

    Investigation of high field effects in SiC films

  • Author

    Sudarshan, Tangali S. ; Nunnally, W.C. ; Manriquez, A. ; Gradinaru, G.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of South Carolina, Columbia, SC, USA
  • fYear
    1993
  • fDate
    7-9 June 1993
  • Firstpage
    159
  • Abstract
    Summary form only given. A focused research program on the high-field properties of SiC is being carried out. Prebreakdown and breakdown phenomena are studied. Surface flashover, a major limitation of PC switches with classical semiconductors (Si and GaAs), is investigated. The influence of the ambient dielectric quality and system configuration on the prebreakdown and breakdown response of the system is studied. The device characteristics and limits of operation at high voltages are analyzed using a time-coordinated nanosecond diagnostics to monitor the applied voltage and the device current. Optical emission signals from UV to IR range using (photomultiplier tubes) and spatially resolved digital imaging of light emission using an intensified, gatable CCD (charge coupled device) camera have been considered.
  • Keywords
    silicon compounds; GaAs; PC switches; Si; SiC films; breakdown phenomena; classical semiconductors; device current; gatable charged coupled device; high field effects; high voltages; light emission; optical emission signals; photomultiplier tubes; prebreakdown phenomena; spatially resolved digital imaging; surface flashover; time-coordinated nanosecond diagnostics; Charge-coupled image sensors; Dielectric breakdown; Electric breakdown; Flashover; Gallium arsenide; Nanoscale devices; Semiconductor films; Silicon carbide; Switches; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
  • Conference_Location
    Vancouver, BC, Canada
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-1360-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1993.593454
  • Filename
    593454