DocumentCode
1935995
Title
Hot-hole and Electron Effects in Dynamically Stressed n-MOSFETs
Author
Weber, W. ; Borchert, I.
Author_Institution
Siemens, Central Research & Development, Microelectronics, Otto-Hahn-Ring 6, D 8000 Mÿnchen 83, FRG
fYear
1989
fDate
11-14 Sept. 1989
Firstpage
719
Lastpage
722
Abstract
Dynamic hot-carrier stresses have been performed with frequency and stress time as parameters. The resulting data show a steeper time dependence than any single static stress. By frequency variations and combinations of static stresses it was found that no transient effects are responsible for it. The results can be explained qualitatively by the subsequent injection of holes and electrons in the dynamic case. This understanding is of great importance for the quality assurance of devices operating in real circuits.
Keywords
Charge carrier processes; Degradation; Electrons; Frequency; Hot carriers; Inverters; MOSFET circuits; Microelectronics; Stress; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location
Berlin, Germany
Print_ISBN
0387510001
Type
conf
Filename
5436501
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