• DocumentCode
    1935995
  • Title

    Hot-hole and Electron Effects in Dynamically Stressed n-MOSFETs

  • Author

    Weber, W. ; Borchert, I.

  • Author_Institution
    Siemens, Central Research & Development, Microelectronics, Otto-Hahn-Ring 6, D 8000 Mÿnchen 83, FRG
  • fYear
    1989
  • fDate
    11-14 Sept. 1989
  • Firstpage
    719
  • Lastpage
    722
  • Abstract
    Dynamic hot-carrier stresses have been performed with frequency and stress time as parameters. The resulting data show a steeper time dependence than any single static stress. By frequency variations and combinations of static stresses it was found that no transient effects are responsible for it. The results can be explained qualitatively by the subsequent injection of holes and electrons in the dynamic case. This understanding is of great importance for the quality assurance of devices operating in real circuits.
  • Keywords
    Charge carrier processes; Degradation; Electrons; Frequency; Hot carriers; Inverters; MOSFET circuits; Microelectronics; Stress; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
  • Conference_Location
    Berlin, Germany
  • Print_ISBN
    0387510001
  • Type

    conf

  • Filename
    5436501