DocumentCode :
1935995
Title :
Hot-hole and Electron Effects in Dynamically Stressed n-MOSFETs
Author :
Weber, W. ; Borchert, I.
Author_Institution :
Siemens, Central Research & Development, Microelectronics, Otto-Hahn-Ring 6, D 8000 Mÿnchen 83, FRG
fYear :
1989
fDate :
11-14 Sept. 1989
Firstpage :
719
Lastpage :
722
Abstract :
Dynamic hot-carrier stresses have been performed with frequency and stress time as parameters. The resulting data show a steeper time dependence than any single static stress. By frequency variations and combinations of static stresses it was found that no transient effects are responsible for it. The results can be explained qualitatively by the subsequent injection of holes and electrons in the dynamic case. This understanding is of great importance for the quality assurance of devices operating in real circuits.
Keywords :
Charge carrier processes; Degradation; Electrons; Frequency; Hot carriers; Inverters; MOSFET circuits; Microelectronics; Stress; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location :
Berlin, Germany
Print_ISBN :
0387510001
Type :
conf
Filename :
5436501
Link To Document :
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