• DocumentCode
    1937592
  • Title

    Membrane multichip module technology on silicon

  • Author

    Cheng, Wheling ; Beiley, Mark A. ; Wong, S. Simon

  • Author_Institution
    Stanford Univ., CA, USA
  • fYear
    1993
  • fDate
    15-18 Mar 1993
  • Firstpage
    69
  • Lastpage
    73
  • Abstract
    A membrane multichip module fabricated on a silicon substrate by utilizing conventional IC processing techniques is discussed. A chip attachment technology to make electrical connections between the wires on a chip and those on the substrate in the membrane area is described. The contacts between the chips and the module are defined by conventional IC photolithography and formed by metal deposition so that they can be very small and dense. The contacts can be located anywhere over an entire chip and not limited just to the edges. The strong bonding of polyimide can ensure the reliability of the modules. The resistance of 10×10-μm2 and 20×20-μm2 contacts is 0.060 Ω/contact and 0.024 Ω/contact, respectively. Multiple-layers of metals are embedded into the membrane to increase the flexibility of routing between chips
  • Keywords
    circuit reliability; contact resistance; integrated circuit technology; multichip modules; photolithography; silicon; substrates; IC photolithography; IC processing techniques; Si substrate; chip attachment technology; contact resistance; electrical connections; membrane multichip module technology; metal deposition; metal multiple layers; module reliability; polyimide bonding; routing; semiconductor; Adhesives; Aluminum; Biomembranes; Bonding; Multichip modules; Polyimides; Routing; Silicon; Sputter etching; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Multi-Chip Module Conference, 1993. MCMC-93, Proceedings., 1993 IEEE
  • Conference_Location
    Santa Cruz, CA
  • Print_ISBN
    0-8186-3540-1
  • Type

    conf

  • DOI
    10.1109/MCMC.1993.302149
  • Filename
    302149