DocumentCode :
1944054
Title :
A Fast Void Detection Algorithm for Three-Dimensional Deposition Simulation
Author :
Ertl, Otmar ; Selberherr, Siegfried
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
1
Lastpage :
4
Abstract :
We present an efficient algorithm for the detection of voids which potentially emerge during deposition process simulation. The application of modern level set techniques and data structures enables the fast determination of connected components directly from the implicit level set representation without the need of an additional surface extraction. The algorithm exhibits optimal linear scaling with surface size and is demonstrated on an example, where an isotropic etching process followed by conformal deposition is simulated.
Keywords :
data structures; etching; conformal deposition; data structures; deposition process simulation; fast void detection algorithm; isotropic etching process; optimal linear scaling; surface extraction; three-dimensional deposition simulation; Area measurement; Computational modeling; Data structures; Detection algorithms; Difference equations; Finite difference methods; Level set; Microelectronics; Narrowband; Surface topography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
Conference_Location :
San Diego, CA
ISSN :
1946-1569
Print_ISBN :
978-1-4244-3974-8
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2009.5290221
Filename :
5290221
Link To Document :
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