Title :
Embedded-mask-methods for mm-scale multi-layer vertical/slanted Si structures
Author :
Mita, Yoshio ; Mita, Makoto ; Tixier, Agnès ; Gouy, Jean-Philippe ; Fujita, Hiroyuki
Author_Institution :
CNRS, Tokyo Univ., Japan
Abstract :
Complicated deep-etched structures having multiple heights and vertical/slanted walls have realized by fully-silicon-based batch fabrication process, which only needs lithography on a flat surface. Arbitrary numbers of mask layers were laminated on the initial surface of a substrate and deep-RIE, LOCOS or anisotropic wet etching were performed to make microstructures using each mask layer subsequently
Keywords :
batch processing (industrial); elemental semiconductors; etching; masks; micromachining; micromechanical devices; oxidation; silicon; LOCOS; Si; anisotropic wet etching; batch fabrication process; deep-RIE; deep-etched structures; embedded-mask-methods; multi-layer vertical/slanted structures; surface micromachined structures; Anisotropic magnetoresistance; CMOS technology; Connectors; Micromachining; Optical filters; Optical materials; Optical resonators; Resists; Sockets; Wet etching;
Conference_Titel :
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
Conference_Location :
Miyazaki
Print_ISBN :
0-7803-5273-4
DOI :
10.1109/MEMSYS.2000.838533
