Measurement and modeling of size and proximity effects in conductor linewidths

Author

Lieneweg, Udo ; Zamani, Nasser

Author_Institution

Center for Space Microelectronics Technol., California Inst. of Technol., Pasadena, CA, USA

fYear

1994

fDate

22-25 Mar 1994

Firstpage

57

Lastpage

61

Abstract

The widths of refractory metal, gold, and Permalloy lines were measured as a function of design width W_i and design spacing S_j using an electrical test structure, the cross-quad-bridge resistor. The data were characterised by the following: a constant linewidth aberration ΔW; a characteristic size effect width W_c; and a characteristic proximity effect spacing S_c. With both characteristic dimensions around |_c|≈|S _c|≈0.4 μm, the effects on a design with W₁≈S₁≈1.2 μm are about (W_c/W ₁)²≈10% each

Keywords

Permalloy; gold; integrated circuit testing; metallisation; spatial variables measurement; Au; Au lines; Permalloy lines; characteristic dimensions; conductor linewidths; constant linewidth aberration; cross-quad-bridge resistor; design spacing; design width; electrical test structure; proximity effects; refractory metal lines; Conductors; Etching; Laboratories; Microelectronics; Propulsion; Proximity effect; Resistors; Size measurement; Space technology; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronic Test Structures, 1994. ICMTS 1994. Proceedings of the 1994 International Conference on

Conference_Location

San Diego, CA

Print_ISBN

0-7803-1757-2

Type

conf

DOI

10.1109/ICMTS.1994.303503

Filename

303503