DocumentCode
1948545
Title
Effect of microstructure on electrical and mechanical properties: Impurities of inkjet-printed Ag and Cu interconnects
Author
Yi, Seol-Min ; Jung, Jung-Kyu ; Choi, Soo-Hong ; Kim, Inyoung ; Jung, Hyun Chul ; Joung, Jaewoo ; Joo, Young-Chang
Author_Institution
Dept. of Mater. Sci. & Eng., Seoul Nat. Univ., Seoul
fYear
2008
fDate
27-30 May 2008
Firstpage
1277
Lastpage
1281
Abstract
Inkjet printing technology is a pattern-on-demand technology which has numerous advantages. However, this technology needs an additional thermal treatment, i.e., drying process. This treatment results in microstructure evolution which is expected to relate to properties of film. The microstructure, electrical and mechanical properties of the inkjet printed Ag and Cu films were characterized as drying process. Model study on electrical resistivity of Ag film shows that the decomposition of capping molecule plays a key role in microstructure evolution and electrical resistivity. The effect of ambient in thermal treatment of inkjet printed Cu film also investigated in this purport. The adhesion strength as a mechanical property was measured by 4 point bend test using sandwiched structure. Strengthening of adhesion was observed as densification of inkjet printed film.
Keywords
adhesion; copper; drying; electrical resistivity; heat treatment; integrated circuit interconnections; metallic thin films; silver; Ag; Cu; adhesion strength; decomposition; densification; drying process; electrical resistivity; inkjet printing technology; interconnects; microstructure; thermal treatment; Adhesives; Electric resistance; Impurities; Ink; Materials science and technology; Mechanical factors; Microstructure; Morphology; Nanoparticles; Printing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2008. ECTC 2008. 58th
Conference_Location
Lake Buena Vista, FL
ISSN
0569-5503
Print_ISBN
978-1-4244-2230-2
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2008.4550139
Filename
4550139
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