DocumentCode :
1953989
Title :
Numerical and experimental results correlation during power MOSFET ageing
Author :
Azoui, T. ; Tounsi, P. ; Dupuy, Ph ; Dorkel, J.M. ; Martineau, D.
Author_Institution :
LAAS, Toulouse, France
fYear :
2012
fDate :
16-18 April 2012
Firstpage :
42373
Lastpage :
42464
Abstract :
This paper presents a methodology, based on 3D electro-thermal simulation, to investigate failures of vertical power MOSFET due to metallization aging of source terminal. The numerical results were correlated with experiment based on past study.
Keywords :
ageing; power MOSFET; semiconductor device metallisation; 3D electro-thermal simulation; metallization aging; power MOSFET ageing; source terminal; vertical power MOSFET; Aging; Conductivity; Degradation; Electrical resistance measurement; Logic gates; Resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE), 2012 13th International Conference on
Conference_Location :
Cascais
Print_ISBN :
978-1-4673-1512-8
Type :
conf
DOI :
10.1109/ESimE.2012.6191798
Filename :
6191798
Link To Document :
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