Using a retro-reflecting echelle grating to improve WDM demux efficiency

Author

Erickson, L. ; Lamontagne, B. ; He, J.J. ; Delage, A. ; Davies, M. ; Koteles, E.

Author_Institution

Inst. for Microstruct. Sci., Nat. Res. Council of Canada, Ottawa, Ont., Canada

fYear

1997

fDate

11-13 Aug. 1997

Firstpage

82

Lastpage

83

Abstract

The use of uncoated facets on the echelle grating in a monolithic InP WDM demux leads to a reflection loss of 5.65 dB for an index of refraction of approximately 3.18. This loss can be largely eliminated by coating the out of plane facet with gold, but it involves another processing step. An alternative is to use total internal reflecting (retro-reflecting) facets. We have fabricated a WDM demultiplexer in InP for use at 1550 nm using an echelle with retro-reflecting facets and have compared its performance to another demux on the same wafer using an echelle with flat facets.

Keywords

III-V semiconductors; demultiplexing equipment; diffraction gratings; indium compounds; light reflection; optical communication equipment; optical fabrication; wavelength division multiplexing; 1550 nm; InP; WDM demultiplexer efficiency; flat facets; performance; retro-reflecting echelle grating; total internal reflecting facets; wafer; Etching; Frequency measurement; Gratings; Indium phosphide; Ion beams; Lithography; Optical refraction; Optical scattering; Optical waveguides; Wavelength division multiplexing;

fLanguage

English

Publisher

ieee

Conference_Titel

Vertical-Cavity Lasers, Technologies for a Global Information Infrastructure, WDM Components Technology, Advanced Semiconductor Lasers and Applications, Gallium Nitride Materials, Processing, and Devi

Conference_Location

Montreal, Que., Canada

Print_ISBN

0-7803-3891-X

Type

conf

DOI

10.1109/LEOSST.1997.619187

Filename

619187