DocumentCode :
1955946
Title :
Photon emission from 70 nm gate length MOSFETs
Author :
Kurino, H. ; Hashimoto, H. ; Hiruma, Y. ; Fujimori, T. ; Koyanagi, M.
Author_Institution :
Res. Center for Integrated Syst., Hiroshima Univ., Japan
fYear :
1992
fDate :
13-16 Dec. 1992
Firstpage :
1015
Lastpage :
1018
Abstract :
The photon emission from extremely small size MOSFETs with L/sub G/=70 nm is observed for the first time. It is found that the electron temperature of the hot electrons monotonously increases while the substrate current to drain current ratio which is related to the avalanche multiplication factor initially increases and then decreases due to the latch effect caused by the parasitic bipolar transistor action as the gate length is reduced from 500 nm to 70 nm. The number of photons emitted with a higher energy has more intimate relation with the charge pumping current change caused by the hot-carrier generated interface states. It is shown that the photon emission is more effective for evaluating the hot carrier phenomenon than the substrate current when the gate length is smaller and the drain voltage is higher.<>
Keywords :
hot carriers; impact ionisation; insulated gate field effect transistors; interface electron states; 70 nm; avalanche multiplication factor; charge pumping current change; electron temperature; gate length; hot electrons; interface states; latch effect; parasitic bipolar transistor action; photon emission; small size MOSFETs; substrate current to drain current ratio; Hot carriers; Impact ionization; Insulated gate FETs; Interface phenomena;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1992. IEDM '92. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0817-4
Type :
conf
DOI :
10.1109/IEDM.1992.307533
Filename :
307533
Link To Document :
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