DocumentCode :
1959871
Title :
Nanolasers directly grown on Si
Author :
Chang-Hasnain, Connie J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of California at Berkeley, Berkeley, CA, USA
fYear :
2012
fDate :
4-8 March 2012
Firstpage :
1
Lastpage :
1
Abstract :
We report a completely new growth mode with which single crystalline InGaAs/GaAs nanopillars can be grown directly on silicon substrates at CMOS compatible temperature. Light emitting diodes, photovoltaic device and optically pumped lasers are achieved.
Keywords :
CMOS integrated circuits; III-V semiconductors; MOCVD; gallium arsenide; indium compounds; integrated optoelectronics; light emitting diodes; nanofabrication; nanophotonics; nanostructured materials; optical pumping; semiconductor growth; semiconductor lasers; CMOS compatible temperature; InGaAs-GaAs; Si; growth mode; light emitting diodes; nanolasers; optically pumped lasers; photovoltaic device; silicon substrates; single crystalline nanopillars; Gallium arsenide; Indium gallium arsenide; Laser modes; Optical films; Optical pumping; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fiber Communication Conference and Exposition (OFC/NFOEC), 2012 and the National Fiber Optic Engineers Conference
Conference_Location :
Los Angeles, CA
ISSN :
pending
Print_ISBN :
978-1-4673-0262-3
Type :
conf
Filename :
6192109
Link To Document :
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