Manipulation of particulate clouds in an RF plasma by magnetic fields

Summary form only given. Particle traps near the plasma-sheath interface in RF plasmas have been studied. These traps have been shown to be potential wells in the near-sheath region of the plasma. The authors have investigated the effects of magnetic fields on these particle traps and have been able to move their location within the plasma. The magnetic field induces a local disturbance in the plasma which serves as a trap capable of attracting particles out of the potential wells. Laser light scattering and Langmuir probe measurements provide insight into the mechanism(s) for the movement of the suspended particulate clouds under the influence of an applied magnetic field on a distribution of particles in the plasma over a silicon wafer. The trap formed by the addition of the magnetic field can be moved away from the area of the wafer being processed. This results in a net reduction of particles on the silicon wafer.