DocumentCode :
1965362
Title :
Effects of well thickness on the light emission in InGaN/GaN and GaN/AlGaN multiple quantum wells
Author :
Smith, M. ; Zeng, K.C. ; Lin, J.Y. ; Jiang, H.X. ; Salvador, A. ; Popovici, G. ; Tang, H. ; Kim, W. ; Morkoc, H. ; Khan, A. ; Chen, Q.
Author_Institution :
Dept. of Phys., Kansas State Univ., Manhattan, KS, USA
fYear :
1997
fDate :
11-13 Aug. 1997
Firstpage :
31
Lastpage :
32
Abstract :
Picosecond time-resolved photoluminescence (TRPL) has been employed to study the effects of well thickness on the light emission properties and recombination dynamics in In/sub x/Ga/sub 1-x/N/GaN and GaN/Al/sub x/Ga/sub 1-x/N multiple quantum wells (MQWs) grown both by metal-organic chemical vapor deposition (MOCVD) and reactive molecular beam epitaxy (MBE). In this work we present results from a set of MOCVD grown In/sub x/Ga/sub 1-x/N/GaN and a set of MBE grown GaN/Al/sub x/Ga/sub 1-x/N MQW samples with well thicknesses varying from 20 to 90 /spl Aring/. Results from these MQW samples are compared with each other and also to InGaN and GaN epilayers to extrapolate the mechanisms and quantum efficiency of the optical emission in these structures. The implications of these results on device applications, in particular for blue LEDs and laser diodes will be discussed.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; photoluminescence; semiconductor quantum wells; time resolved spectra; GaN-AlGaN; InGaN-GaN; blue LED; epilayer; laser diode; light emission; metal-organic chemical vapor deposition; multiple quantum well; picosecond time-resolved photoluminescence; quantum efficiency; reactive molecular beam epitaxy; recombination dynamics; Chemical vapor deposition; Diode lasers; Gallium nitride; Light emitting diodes; MOCVD; Molecular beam epitaxial growth; Photoluminescence; Quantum well devices; Radiative recombination; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vertical-Cavity Lasers, Technologies for a Global Information Infrastructure, WDM Components Technology, Advanced Semiconductor Lasers and Applications, Gallium Nitride Materials, Processing, and Devi
Conference_Location :
Montreal, Que., Canada
Print_ISBN :
0-7803-3891-X
Type :
conf
DOI :
10.1109/LEOSST.1997.619249
Filename :
619249
Link To Document :
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