DocumentCode :
1968505
Title :
Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography
Author :
Bai, Yinbing ; Zhang, A. Ping
Author_Institution :
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
fYear :
2010
fDate :
8-12 Dec. 2010
Firstpage :
469
Lastpage :
470
Abstract :
Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.
Keywords :
lithography; nanopatterning; 2D quasi-crystal structures; fabrication technology; internal nanopatterns; large-area submicron structures; multiexposure two-beam interference lithography; periodic microstructures; periodic structures; precisely controlled exposure directions; Interference; Laser beams; Lithography; Optical device fabrication; Optical polarization; Periodic structures;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Communications and Photonics Conference and Exhibition (ACP), 2010 Asia
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-7111-9
Type :
conf
DOI :
10.1109/ACP.2010.5682582
Filename :
5682582
Link To Document :
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