DocumentCode
1969747
Title
A GaAs FET Designed for Maximum Flexibility in Electrical Performance
Author
Bujatti, M. ; Massani, M.
Author_Institution
SELENIA S.p.A. via Tiburtina km. 12,400 - 00131 Roma, Italy.
fYear
1977
fDate
5-8 Sept. 1977
Firstpage
90
Lastpage
94
Abstract
A simple process has been developped which enables us to produce GaAs FET´s with enough flexibility in the geometry to adjust for a wide range of circuits requirements. In order to gain control on the active layer we used ion implantation on semi-insulating substrates. Results obtained an epitaxial and implanted layers are compared. Power output and S parameters are measured as a function of the gate width.
Keywords
Etching; FETs; Flexible printed circuits; Frequency; Gain control; Gallium arsenide; Geometry; Ion implantation; Ohmic contacts; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 1977. 7th European
Conference_Location
Copenhagen, Denmark
Type
conf
DOI
10.1109/EUMA.1977.332408
Filename
4131057
Link To Document