Title :
Highly-nonlinear ultrafast plasmonic waveguide device on SOI
Author_Institution :
Dept. of Electron. Eng., Shanghai Jiao Tong Univ., Shanghai, China
Abstract :
We propose a step-structure hybrid plasmon waveguide on silicon-on-insulator (SOI). The metal step provides an additional degree of freedom to trade-off between mode confinement and attenuation. The achieved nonlinearity is 2-3 orders larger than that of conventional silicon waveguide. We then design an ultra-compact, broadband optical parametric amplifier (OPA) using such a structure.
Keywords :
elemental semiconductors; optical parametric amplifiers; plasmonics; silicon; silicon-on-insulator; waveguides; SOI; broadband optical parametric amplifier; highly-nonlinear ultrafast plasmonic waveguide device; silicon waveguide; silicon-on-insulator; step-structure hybrid plasmon waveguide; ultracompact optical parametric amplifier; Metals; Optical amplifiers; Optical waveguides; Plasmons; Silicon; Stimulated emission; Waveguide discontinuities;
Conference_Titel :
Communications and Photonics Conference and Exhibition (ACP), 2010 Asia
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-7111-9
DOI :
10.1109/ACP.2010.5682712
