• DocumentCode
    1972111
  • Title

    Degradation and reliability of silicon power transistors

  • Author

    Schmitz, Jurriaan

  • Author_Institution
    University of Twente Drienerlolaan 5, Enschede, 7522 NB Netherlands
  • fYear
    2013
  • fDate
    13-17 Oct. 2013
  • Firstpage
    19
  • Lastpage
    19
  • Abstract
    The degradation of silcon power transistors (RESURF LDMOS type) are studied under high voltage off-state and on-state stress conditions. The deterioration of the devices is shown to be hot-carrier dominated. Hot carrier damage occurs at the drain side of the drift region and leads to changing I-Vcurves in two distinct regimes. With a non-invasive low-voltage leakage characterization the surface generation velocity profiles after stress can be extracted. These enable predictions of the I-V behaviour across a wide temperature range, and may be used for reliability projections of these devices.
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IRW), 2013 IEEE International
  • Conference_Location
    South Lake Tahoe, CA, USA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4799-0350-4
  • Type

    conf

  • DOI
    10.1109/IIRW.2013.6804144
  • Filename
    6804144