DocumentCode :
1975530
Title :
Influence of deposition temperature on the properties of Al2O3 thin films
Author :
Zhan, Meiqiong ; Wu, Luo ; Shao, Jianda
Author_Institution :
Shanghai Second Polytech. Univ., Shanghai, China
fYear :
2009
fDate :
30-3 Aug. 2009
Firstpage :
1
Lastpage :
2
Abstract :
Al2O3 thin films were characterized by optical and structural properties, as well as LIDT under 355 nm Nd:YAG laser. It was found that the deposition temperature had no clear effect on the LIDT in our experiments.
Keywords :
aluminium compounds; optical properties; solid lasers; Al2O3; LIDT; Nd:YAG laser; deposition temperature; optical properties; spectral properties; thin films; wavelength 355 nm; Aluminum oxide; Coatings; Dielectric thin films; Mechanical factors; Optical films; Optical filters; Plasma temperature; Solids; Sputtering; Substrates; Al2O3; deposition temperature; laser-induced damage threshold (LIDT);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3829-7
Electronic_ISBN :
978-1-4244-3830-3
Type :
conf
DOI :
10.1109/CLEOPR.2009.5292389
Filename :
5292389
Link To Document :
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