• DocumentCode
    1976465
  • Title

    1 GHz 100 W Internally Matched Static Induction Transistor

  • Author

    Aiga, M. ; Higaki, Y. ; Kato, M. ; Kajiwara, Y. ; Yukimoto, Y. ; Shirahata, K.

  • Author_Institution
    Semiconductor Laboratory, Mitsubishi Electric Corporation, 4-1, Mizuhara, Itami, Hyogo, 664, JAPAN
  • fYear
    1979
  • fDate
    17-20 Sept. 1979
  • Firstpage
    561
  • Lastpage
    565
  • Abstract
    A 1 GHz lOOW transistor has been accomplished with a new silicon device, static induction transistor. A fine patterning technique brought the transistor chip to a high pawer capacity without sacrificing a power gain. An internal matching technique was employed to ensure the parallel openration of multi-celled transistor chips. As a result, at 1 GHz CW operation, a gain of 4 dB and a drain efficiency of 55 % with an output paver of 100 watts was obtained. The saturation output power, at 1 dB gain compression point, was 110 watts. This successful performance was brought by the achievement of even power sharing, which was obtained by the aids of the internal matching and a thermal stability at high current region of the static induction transistor in its nature.
  • Keywords
    Bipolar transistors; Capacitance; Electrodes; Fabrication; Gain; Microwave devices; Power generation; Silicon devices; Solid state circuits; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 1979. 9th European
  • Conference_Location
    Brighton, UK
  • Type

    conf

  • DOI
    10.1109/EUMA.1979.332767
  • Filename
    4131409