DocumentCode
1978102
Title
Future silicon technology
Author
Kim, Kinam
Author_Institution
SAIT, Samsung Electron. Co., Yongin, South Korea
fYear
2012
fDate
17-21 Sept. 2012
Firstpage
1
Lastpage
6
Abstract
Dimensional scaling will continue in Si CMOS technology which will extend to beyond 10nm. Key challenges for dimensional scaling and expansion of silicon-based technologies as well as research directions will be reviewed in traditional semiconductor applications such as DRAM, NAND Flash, logic as well as advanced devices including STT-MRAM, ReRAM and reconfigurable logic. Furthermore, other areas where Si technologies play import roles will be presented including power electronics, solid-state lighting as well as DNA sequencing and medical imaging.
Keywords
CMOS logic circuits; MRAM devices; CMOS technology; ReRAM; STT-MRAM; dimensional scaling; reconfigurable logic; semiconductor applications; silicon technology; silicon-based technologies; Gallium nitride; Logic gates; Optical interconnections; Random access memory; Silicon; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
ESSCIRC (ESSCIRC), 2012 Proceedings of the
Conference_Location
Bordeaux
ISSN
1930-8833
Print_ISBN
978-1-4673-2212-6
Electronic_ISBN
1930-8833
Type
conf
DOI
10.1109/ESSCIRC.2012.6341243
Filename
6341243
Link To Document