• DocumentCode
    1978102
  • Title

    Future silicon technology

  • Author

    Kim, Kinam

  • Author_Institution
    SAIT, Samsung Electron. Co., Yongin, South Korea
  • fYear
    2012
  • fDate
    17-21 Sept. 2012
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Dimensional scaling will continue in Si CMOS technology which will extend to beyond 10nm. Key challenges for dimensional scaling and expansion of silicon-based technologies as well as research directions will be reviewed in traditional semiconductor applications such as DRAM, NAND Flash, logic as well as advanced devices including STT-MRAM, ReRAM and reconfigurable logic. Furthermore, other areas where Si technologies play import roles will be presented including power electronics, solid-state lighting as well as DNA sequencing and medical imaging.
  • Keywords
    CMOS logic circuits; MRAM devices; CMOS technology; ReRAM; STT-MRAM; dimensional scaling; reconfigurable logic; semiconductor applications; silicon technology; silicon-based technologies; Gallium nitride; Logic gates; Optical interconnections; Random access memory; Silicon; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ESSCIRC (ESSCIRC), 2012 Proceedings of the
  • Conference_Location
    Bordeaux
  • ISSN
    1930-8833
  • Print_ISBN
    978-1-4673-2212-6
  • Electronic_ISBN
    1930-8833
  • Type

    conf

  • DOI
    10.1109/ESSCIRC.2012.6341243
  • Filename
    6341243