Foreword

The first ULtimate Integration of Silicon (ULIS) conference took place in Grenoble (France), in January 2000. During this first event, we had 4 invited speakers, all of them focused on the issue of CMOS device scaling. ULIS is back in Grenoble for its 13th edition, and the content of this conference is a good illustration of the significant evolutions that our domain has faced in past 12 years. The issue of innovative device architecture will be extensively discussed in this 2012 edition of ULIS, not only in the tutorials, but also in the conference itself, with four invited speakers and eight sessions. This edition of ULIS is however not only about changing device architecture as research in Silicon devices and technology is no longer exclusively focused on improving CMOS transistors by scaling. Technology has now to join its effort together with circuit design to achieve, together, the performances required by the Moore´s law. This exciting new trend of our field will be covered.