DocumentCode :
1980539
Title :
Influence of wafer symmetry on the dynamic parameters of rectangular plates
Author :
Pentovelis, Georgios ; Boudy, Caroline ; Jeannerot, Véronique
Author_Institution :
Telelec Temex Components, Pont Sainte Marie, France
Volume :
1
fYear :
1999
fDate :
1999
Firstpage :
453
Abstract :
During the manufacture of rectangular resonators, we have shown the necessity of accurately determining the acceptable tolerances for surface flatness and parallelism of the raw material, in this case an AT cut wafer 38.1×38.1 mm. To this end, we have investigated the dynamic parameter variations of finished units as a function of different levels of surface parallelism. Initially the wafers are plane-parallel, hence we introduced a change of parallelism by chemical etching. Different evolutions of impedance, inductance, Q-factor and unwanted modes in relation to the main mode due to the angular error caused by loss of parallelism in both directions X and Z are discussed
Keywords :
Q-factor; crystal resonators; inductance; surface topography; symmetry; 38.1 mm; AT cut wafer; Q-factor; chemical etching; dynamic parameter variations; impedance; inductance; rectangular plates; rectangular resonators; surface flatness; surface parallelism; unwanted modes; wafer symmetry; Chemicals; Electrodes; Etching; Inductance; Manufacturing; Q factor; Raw materials; Surface finishing; Surface impedance; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency and Time Forum, 1999 and the IEEE International Frequency Control Symposium, 1999., Proceedings of the 1999 Joint Meeting of the European
Conference_Location :
Besancon
ISSN :
1075-6787
Print_ISBN :
0-7803-5400-1
Type :
conf
DOI :
10.1109/FREQ.1999.840804
Filename :
840804
Link To Document :
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