Title :
Cut-independent quartz resonator micromachining by ion track lithography
Author :
Rapp, Håkan ; Hjort, Klas
Author_Institution :
Angstrom Lab., Uppsala Univ., Sweden
Abstract :
The ability of ion track lithography to achieve arbitrary resonator elements in quartz is shown. In X-cut quartz, tuning forks and length extensional resonators have been manufactured, to show the ability by ion track lithography wet etching to micromachine resonators in an otherwise difficult configuration. In AT-cut two kinds of moated resonators have been realized, with the prospect of lowering mounting stresses. The suggestion is that this technology enables low-cost structuring of most lateral geometries in any crystal cut of quartz. Therefore, more stable low-cost BAW resonators can be envisioned
Keywords :
bulk acoustic wave devices; crystal resonators; ion beam lithography; micromachining; AT-cut; SiO2; cut-independent quartz resonator; ion track lithography; length extensional resonators; low-cost BAW resonators; micromachining; moated resonators; mounting stresses; tuning forks; wet etching; Anisotropic magnetoresistance; Costs; Frequency; Geometry; Lithography; Manufacturing; Micromachining; Stress; Vibrations; Wet etching;
Conference_Titel :
Frequency and Time Forum, 1999 and the IEEE International Frequency Control Symposium, 1999., Proceedings of the 1999 Joint Meeting of the European
Conference_Location :
Besancon
Print_ISBN :
0-7803-5400-1
DOI :
10.1109/FREQ.1999.840812