Title :
A tight-binding study of channel modulation in atomic-scale Si:P nanowires
Author :
Hoon Ryu ; Sunhee Lee ; Weber, Bruce ; Mahapatra, Santanu ; Simmons, M.Y. ; Hollenberg, Lloyd C. L. ; Klimeck, Gerhard
Author_Institution :
Korea Inst. of Sci. & Technol. Inf., Daejeon, South Korea
Abstract :
It has been well understood that ultrathin, highly P δ-doped Si (Si:P) nanowires are metallic at charge-neutrality (Ref. [5]). This work extends the scope of tight-binding modeling beyond charge-neutrality to examine the channel modulation of a 1.5nm wide, 1/4 monolayer(ML)-doped Si:P nanowire and its effect on the channel conductance. Subband-anticrossing plays a key role in the channel modulation, creating a local minimum in the ballistic conductance as the channel is occupied with more electrons. While the channel modulation causes a fluctuation in the conductance, nanowires still remain metallic boding well for their utility as potential interconnects.
Keywords :
electric admittance; monolayers; nanowires; phosphorus; silicon; Si:P; atomic-scale nanowires; ballistic conductance; channel conductance; channel modulation; charge neutrality; size 1.5 nm; subband-anticrossing; tight binding modeling; Atomic layer deposition; Dispersion; Electric potential; Electrostatics; Modulation; Nanowires; Silicon;
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location :
Glasgow
Print_ISBN :
978-1-4673-5733-3
DOI :
10.1109/SISPAD.2013.6650578