Sputtered thin film boron nitride cold emitters on metal substrates

Author

Pryor, E.W. ; Lihua Li ; Busta, H.H.

Author_Institution

Wayne State Univ., Detroit, MI, USA

fYear

1997

fDate

10-10 Dec. 1997

Firstpage

733

Lastpage

736

Abstract

Carbon-doped BN films of about 100 nm thickness were deposited by reactive magnetron sputtering on "smooth" and beadblasted Mo and Nb substrates. Electron emission, at a given extraction voltage, is orders of magnitude larger from the BN coated surfaces. Emission from the beadblasted surfaces is enhanced over emission from the smooth surfaces due to increased field emission from the beadblasted-induced surface protrusions. With a 0.5 mm diameter extraction electrode, current densities of 0.35 A/cm/sup 2/ were obtained. Emission stays constant to pressures of about 1/spl times/10/sup -4/ Torr.

Keywords

boron compounds; carbon; current density; electron field emission; molybdenum; niobium; sputtered coatings; substrates; thin films; vacuum microelectronics; 1E-4 torr; BN:C-Mo; BN:C-Nb; C-doped BN films; Mo; Mo substrate; Nb; Nb substrate; beadblasted substrates; current densities; electron emission; metal substrates; reactive magnetron sputtering; smooth substrates; sputtered thin film cold emitters; surface protrusions; Boron; Current density; Niobium; Optical films; Plasma temperature; Sputtering; Substrates; Surface emitting lasers; Surface treatment; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International

Conference_Location

Washington, DC, USA

ISSN

0163-1918

Print_ISBN

0-7803-4100-7

Type

conf

DOI

10.1109/IEDM.1997.650487

Filename

650487