A selectively metallized, microfabricated W-band meander line TWT circuit

Author

Sengele, Sean ; Jiang, Hongrui ; Booske, John H. ; Van der Weide, Daniel ; Kory, Carol ; Ives, Lawrence

Author_Institution

Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI

fYear

2008

fDate

22-24 April 2008

Firstpage

18

Lastpage

19

Abstract

The development of a selective metallization process capable of metallizing only the top of a microfabricated, raised meander line ridge is described. This fabrication process has unique potential in the development of millimetre-wave and terahertz regime slow wave structures for travelling wave tubes. The fabrication process will be described and the latest images and measured data will be presented.

Keywords

metallisation; millimetre wave circuits; slow wave structures; submillimetre wave circuits; W-band meander line TWT circuit; metallisation; microfabrication; millimetre-wave regime; raised meander line ridge; slow wave structures; terahertz regime; travelling wave tubes; Circuits; Drives; Electromagnetic coupling; Fabrication; Metallization; Micromechanical devices; Silicon; Telephony; Testing; Wavelength measurement; MEMS; TWT; meander line; mm-wave; selective metallization;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International

Conference_Location

Monterey, CA

Print_ISBN

978-1-4244-1715-5

Type

conf

DOI

10.1109/IVELEC.2008.4556322

Filename

4556322