Study on magnetized inductively coupled plasma with Nagoya III antenna

Summary form only given, as follows. High-density plasmas generated in a magnetized inductively coupled plasma attract applications such as high rate etching and deposition processes for semiconductor fabrication. Thus, it is very important to know the characteristics of the magnetized inductively coupled plasma. In this study, the ion mass, collisional and magnetic effects on the generation of a magnetized inductively coupled plasma were considered. The plasma was generated at 1356 MHz RF power with the Nagoya type (m=1) antenna in compact cylindrical reactors. Permanent magnets and electromagnets were arranged around the chamber to produce the magnetic field along the axis of the reactor.