Beam energy enhancement studies in a plasma sputter-type negative ion source

Summary form only given, as follows. A one-liter volume plasma sputter-type negative ion source is used for the production of metal ions like Zr/sup -/ and ions like O/sup -/ and H/sup -/ depending on the target material and gas. The energies of these ions have been obtained in the range of a few hundred eV using a retarding potential-type electrostatic energy analyzer. In this work, the range of energies is enhanced to the keV range by proper focusing and acceleration schemes of the self-extracted ions. Ion beam characterization include measurements of beam energy, ion current density, perveance and emittance. The results for cesiated and uncesiated targets are discussed.