DocumentCode
2014571
Title
MBE growth of GaPx As1−x and GaSbx As1−x solid solutions with As2 or As4 molecular beam
Author
Emelyanov, Eugene A. ; Putyato, Mikhail A. ; Semyagin, Boris R. ; Vasilenko, A. ; Preobrazhenskii, Valery V.
Author_Institution
Inst. of Semicond. Phys., SB RAS, Novosibirsk, Russia
fYear
2010
fDate
June 30 2010-July 4 2010
Firstpage
109
Lastpage
110
Abstract
The composition of multicomponent AIIIBV solid solutions allows designing semiconductor heterostructures with desired properties to solve the so-called problem of “band engineering”. Growth of solid solution with given composition is a serious problem. Prediction of solid solution composition based on the growth model could facilitate solution of this task. Information about interaction of group V molecules with the growth surface is required to create such a model. Therefore, determination of adsorption, desorption, diffusion, and incorporation kinetic constants for these molecules is an important task. This can be achieved through a comparative analysis of incorporation effectiveness of antimony, phosphorus, and arsenic from different molecular forms.
Keywords
III-V semiconductors; adsorption; antimony compounds; desorption; diffusion; gallium compounds; molecular beam epitaxial growth; phosphorus compounds; semiconductor epitaxial layers; semiconductor growth; semiconductor heterojunctions; solid solutions; GaPxAs1-x; GaSbxAs1-x; MBE; adsorption; desorption; diffusion; molecular-beam epitaxy; semiconductor heterostructures; solid solutions; Molecular beam epitaxial growth; Seminars; “band engineering”; Molecular-beam epitaxy (MBE); arsenic molecular form; multicomponent AIIIBV solid solutions;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro/Nanotechnologies and Electron Devices (EDM), 2010 International Conference and Seminar on
Conference_Location
Novosibirsk
Print_ISBN
978-1-4244-6626-9
Type
conf
DOI
10.1109/EDM.2010.5568645
Filename
5568645
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