Title :
Dispersive optical parameters of evaporated nickel films
Author :
Atuchin, Victor V. ; Grigorieva, Tatiana I. ; Kruchinin, Vladimir N. ; Lychagin, Dmitry V. ; Pokrovsky, Lev D.
Author_Institution :
Lab. of Opt. Mater. & Struct., SB RAS, Novosibirsk, Russia
fDate :
June 30 2010-July 4 2010
Abstract :
Dispersion of refractive index and extinction coefficient of nickel film and nickel crystal surface (100) has been determined with spectroscopic ellipsometry over spectral range λ ~ 250-1030 nm. Nickel film has been prepared by thermal evaporation method. Nickel crystal has been grown by horizontal Bridgman method. The crystal surface (100) at a first stage was mechanically polished and then treated by electro-polishing to remove the damage layer.
Keywords :
crystal growth from melt; electrolytic polishing; ellipsometry; extinction coefficients; metallic thin films; nickel; optical dispersion; optical films; optical materials; refractive index; vacuum deposition; Ni; dispersive optical parameters; electropolishing; evaporated nickel films; extinction coefficient; horizontal Bridgman method; mechanical polishing; nickel crystal surface; refractive index dispersion; spectroscopic ellipsometry; thermal evaporation; wavelength 250 nm to 1030 nm; Ash; Integrated optics; Optical films; Seminars; Nickel; extinction coefficient; refractive index; spectroscopic ellipsometry; surface structure;
Conference_Titel :
Micro/Nanotechnologies and Electron Devices (EDM), 2010 International Conference and Seminar on
Conference_Location :
Novosibirsk
Print_ISBN :
978-1-4244-6626-9
DOI :
10.1109/EDM.2010.5568677
