Dispersive optical parameters of evaporated nickel films

Author

Atuchin, Victor V. ; Grigorieva, Tatiana I. ; Kruchinin, Vladimir N. ; Lychagin, Dmitry V. ; Pokrovsky, Lev D.

Author_Institution

Lab. of Opt. Mater. & Struct., SB RAS, Novosibirsk, Russia

fYear

2010

fDate

June 30 2010-July 4 2010

Firstpage

37

Lastpage

39

Abstract

Dispersion of refractive index and extinction coefficient of nickel film and nickel crystal surface (100) has been determined with spectroscopic ellipsometry over spectral range λ ~ 250-1030 nm. Nickel film has been prepared by thermal evaporation method. Nickel crystal has been grown by horizontal Bridgman method. The crystal surface (100) at a first stage was mechanically polished and then treated by electro-polishing to remove the damage layer.

Keywords

crystal growth from melt; electrolytic polishing; ellipsometry; extinction coefficients; metallic thin films; nickel; optical dispersion; optical films; optical materials; refractive index; vacuum deposition; Ni; dispersive optical parameters; electropolishing; evaporated nickel films; extinction coefficient; horizontal Bridgman method; mechanical polishing; nickel crystal surface; refractive index dispersion; spectroscopic ellipsometry; thermal evaporation; wavelength 250 nm to 1030 nm; Ash; Integrated optics; Optical films; Seminars; Nickel; extinction coefficient; refractive index; spectroscopic ellipsometry; surface structure;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro/Nanotechnologies and Electron Devices (EDM), 2010 International Conference and Seminar on

Conference_Location

Novosibirsk

Print_ISBN

978-1-4244-6626-9

Type

conf

DOI

10.1109/EDM.2010.5568677

Filename

5568677