• DocumentCode
    2015454
  • Title

    Generation of hot carriers by secondary impact ionization in deep submicron devices: model and light emission characterization

  • Author

    Marchand, B. ; Blachier, D. ; Leroux, C. ; Ghibaudo, G. ; Balestra, F. ; Reimbold, G.

  • Author_Institution
    Lab. de Phys. des Composants a Semicond., ENSERG, Grenoble, France
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    93
  • Lastpage
    97
  • Abstract
    This paper gives a deep insight on the secondary impact ionization phenomenon. A simple and accurate analytical model of the gate current in deep sub-micron MOS devices is presented, taking into account the substrate bias and the temperature influence. Also for the first time, the related light emission is analyzed. The spectrum analysis is shown to allow individual observation of both first and secondary impact ionizations. Secondary ionization is shown to correlate to substrate current. The photon origin is discussed
  • Keywords
    MOSFET; hot carriers; impact ionisation; semiconductor device models; MOS devices; deep submicron devices; gate current; hot carriers; light emission; secondary impact ionization; substrate bias; Doping; Equations; Hot carriers; Impact ionization; MOSFETs; Physics; Semiconductor process modeling; Substrate hot electron injection; Temperature dependence; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2000. Proceedings. 38th Annual 2000 IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-5860-0
  • Type

    conf

  • DOI
    10.1109/RELPHY.2000.843896
  • Filename
    843896