DocumentCode
2015454
Title
Generation of hot carriers by secondary impact ionization in deep submicron devices: model and light emission characterization
Author
Marchand, B. ; Blachier, D. ; Leroux, C. ; Ghibaudo, G. ; Balestra, F. ; Reimbold, G.
Author_Institution
Lab. de Phys. des Composants a Semicond., ENSERG, Grenoble, France
fYear
2000
fDate
2000
Firstpage
93
Lastpage
97
Abstract
This paper gives a deep insight on the secondary impact ionization phenomenon. A simple and accurate analytical model of the gate current in deep sub-micron MOS devices is presented, taking into account the substrate bias and the temperature influence. Also for the first time, the related light emission is analyzed. The spectrum analysis is shown to allow individual observation of both first and secondary impact ionizations. Secondary ionization is shown to correlate to substrate current. The photon origin is discussed
Keywords
MOSFET; hot carriers; impact ionisation; semiconductor device models; MOS devices; deep submicron devices; gate current; hot carriers; light emission; secondary impact ionization; substrate bias; Doping; Equations; Hot carriers; Impact ionization; MOSFETs; Physics; Semiconductor process modeling; Substrate hot electron injection; Temperature dependence; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 2000. Proceedings. 38th Annual 2000 IEEE International
Conference_Location
San Jose, CA
Print_ISBN
0-7803-5860-0
Type
conf
DOI
10.1109/RELPHY.2000.843896
Filename
843896
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