DocumentCode
2016587
Title
High-speed ethylene-oxide plasma sterilization system without toxic residuals
Author
Matsumoto, Kaname ; Kanitani, M.
Author_Institution
Fac. of Informatics, Toyama Prefectural Univ., Japan
fYear
2003
fDate
5-5 June 2003
Firstpage
285
Abstract
Summary form only given, as follows. We have developed a high-speed ethylene-oxide gas sterilizer without toxic residuals by using a poly-phase AC discharge plasma. The amount of gas use is 1/50 or less compared with the conventional ethylene-oxide gas sterilization system. Moreover, the whole sterilization-time is 1/20 or less, including the post-processing time to decompose toxic residuals.
Keywords
organic compounds; plasma applications; AC discharge plasma; ethylene-oxide; plasma sterilization system; toxic residuals; Air pollution; Aluminum; Electrodes; Electron beams; Gases; Plasma chemistry; Plasma temperature; Surface contamination; Surface discharges; Thermal pollution;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1228837
Filename
1228837
Link To Document