DocumentCode :
2020175
Title :
Design and Development of Square and Circular Micromachined Patch Antennas at Ka-band
Author :
Sharma, Preeti ; Koul, Shiban K. ; Chandra, Sudhir
Author_Institution :
Center for Appl. Res. in Electron., Indian Inst. of Technol. Delhi, New Delhi
fYear :
2006
fDate :
12-14 Sept. 2006
Firstpage :
130
Lastpage :
134
Abstract :
In this paper, we report the design, development and fabrication of high performance Ka-band square and circular micromachined patch antenna using post-CMOS compatible process technology. The main emphasis of this paper is to use RF sputtering as potential metal-dielectric film deposition-process for rapid prototyping of many antenna structures in the absence of access to a well-established MEMS foundry. The fabricated antenna resonated at 35 GHz with 4.0 % impedance bandwidth
Keywords :
CMOS integrated circuits; micromachining; micromechanical devices; microstrip antennas; microwave antennas; sputtering; 35 GHz; CMOS compatible process technology; Ka-band circular micromachined patch antenna; Ka-band square micromachined patch antenna; MEMS foundry; RF sputtering; bulk micromachining; metal-dielectric film deposition-process; silicon nitride membrane; Bandwidth; Biomembranes; Conductivity; Dielectric resonator antennas; Dielectric substrates; Impedance; Microstrip antennas; Patch antennas; Radio frequency; Silicon; Bulk-Micromachining; Circular patch antenna; Micromachined patch antenna; RF sputtering; Square patch antenna; silicon nitride membrane;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
RF and Microwave Conference, 2006. RFM 2006. International
Conference_Location :
Putra Jaya
Print_ISBN :
0-7803-9745-2
Electronic_ISBN :
0-7803-9745-2
Type :
conf
DOI :
10.1109/RFM.2006.331053
Filename :
4133568
Link To Document :
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