DocumentCode
2020772
Title
Tapered-capillary pinch plasma as a candidate for bright EUV source
Author
Maejima, F. ; Iida, C. ; Nakajima, Masahiro ; Horioka, Kazuhiko
Author_Institution
Dept. of Energy Sci., Tokyo Inst. of Technol., Yokohama, Japan
fYear
2003
fDate
5-5 June 2003
Firstpage
372
Abstract
Summary form only given, as follows. In connection with the development of a bright EUV source, dynamics of pinching plasma in tapered capillary tubes is investigated. The basic configuration of the experimental setup is quite similar to conventional capillary source except the shape of the capillary wall. The capillary has thin conical wall, i.e., a Laval Nozzle geometry, and into which a working gas is supersonically injected. A high current discharge makes strong but slightly declining azimuthal magnetic field, which contracts the plasma radially and also axially. If the discharge condition influencing the plasma behavior is optimized, the plasma is expected to be compressed radially and also driven axially by the B-gradient made by the phased pinching. As the first step of the research and development, temporal behaviors of the plasma are observed using a fast streak camera. As has been predicted by numerical simulations, the pinching behaviors depend on the initial gas density, capillary length and the aspect ratio of the tubes. At a proper discharge condition, the framing photos confirm the point like formation and the pinching effect in radial and also axial direction. In the presentation, prospect for future study is discussed with the preliminary experimental results.
Keywords
discharges (electric); pinch effect; ultraviolet sources; B-gradient; Laval nozzle; axial direction; azimuthal magnetic field; bright EUV source; high current discharge; numerical simulations; pinching plasma dynamics; radial direction; tapered capillary tubes; temporal behaviors; thin conical wall; Cameras; Contracts; Fault location; Geometry; Magnetic fields; Plasma density; Plasma simulation; Plasma sources; Research and development; Shape;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1229003
Filename
1229003
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