Influence of rubber nanoparticles on the properties of Novolac-diazonaphthoquinone based photoresist

In the present study, we have been trying to improve adhesion, heat resistant and chemistry resistant of positive photoresists through introducing rubber nanoparticles into positive photoresist (Novolac-diazonaphthoquinone) system. Thereinto, the photoresist sample with 8 wt% of rubber nanoparticles possess higher thermal stability (322.8 °C@ 5wt% loss), higher adhesion strength (402.50 Kg/cm²). Furthermore, the photoresist film after curing can sustain various chemicals, such as acid, base and organic solvent. At last, the novel positive photoresist was also exposed at 365 nm (I line) and developed in base solution to yield ultrafine pattern. Therefore, we developed novel photoresist including rubber nanoparticles which possess excellent complex performance and can be used as structural material in device.