Title :
Holistic Cycle Time Analysis and Improvement Project within a 200mm Lithography I-line Production Area
Author :
Zarbock, Thomas ; Lehmann, Frank ; Fellendorf, Jens
Author_Institution :
Infineon Technol. AG, Saxony
Abstract :
In this paper, a holistic approach for analyzing and improving a work center´s performance focusing on cycle time improvement is described. We give an insight into the setup and execution of the project as well as achieved results and success factors. Also, lessons learned within this project are shared
Keywords :
lithography; manufacturing processes; production management; 200 mm; cycle time improvement; lithography; Dispatching; Flow production systems; Industrial engineering; Job shop scheduling; Lithography; Performance analysis; Production systems; Queueing analysis; Semiconductor device manufacture; Time to market;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638736
