An Empirical Study of Photomask Manufacturing Productivity

Author

Berglund, C. Neil ; Weber, Charles M. ; Castilla, Cesar

Author_Institution

Portland State Univ., OR

fYear

2006

fDate

22-24 May 2006

Firstpage

439

Lastpage

445

Abstract

A survey-based, empirical study of photomask manufacturing productivity has led to a few significant conclusions. Firstly, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Secondly, high downtime of pattern generation tools is limiting productivity. Thirdly, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale

Keywords

cost reduction; economies of scale; investment; manufacturing systems; masks; productivity; cost-reduction opportunities; economies of scale; engineering investment; pattern generation tools; photomask manufacturing productivity; productivity indicators; Costs; Economies of scale; Instruments; Investments; Manufacturing processes; Productivity; Protection; Pulp manufacturing; Semiconductor device manufacture; Technology management;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE

Conference_Location

Boston, MA

ISSN

1078-8743

Print_ISBN

1-4244-0254-9

Type

conf

DOI

10.1109/ASMC.2006.1638798

Filename

1638798