Title :
Finite integration (FI) method for modelling optical waves in lithography masks
Author :
Rahimi, Z. ; Erdmann, A. ; Pflaum, C.
Author_Institution :
Fraunhofer Inst. IISB, Erlangen, Germany
Abstract :
Light diffraction from lithography masks depends on the geometrical shape of the mask pattern which is created by an etch process. The analysis of relevant effects requires the application of an accurate electromagnetic field solver. In this paper, we present an appropriate simulation method based on the Finite Integration (FI) technique for solving Maxwell´s equations.
Keywords :
Maxwell equations; integration; light diffraction; masks; photolithography; Maxwell equations; electromagnetic field solver; finite integration method; light diffraction; lithography masks; mask pattern geometrical shape; optical waves; Electromagnetic analysis; Electromagnetic diffraction; Electromagnetic fields; Etching; Geometrical optics; Integrated optics; Lithography; Maxwell equations; Optical diffraction; Shape;
Conference_Titel :
Electromagnetics in Advanced Applications, 2009. ICEAA '09. International Conference on
Conference_Location :
Torino
Print_ISBN :
978-1-4244-3385-8
Electronic_ISBN :
978-1-4244-3386-5
DOI :
10.1109/ICEAA.2009.5297317
