DocumentCode :
2043540
Title :
Fabrication and Characteristics of GaAs Field Emitters
Author :
Takigawa, Yoshihito ; Neo, Yoichiro ; Mimura, Hidenori
Author_Institution :
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu
fYear :
2006
fDate :
38899
Firstpage :
307
Lastpage :
308
Abstract :
In this paper, fabrication and characteristics of GaAs field emitters were studied. The front and back sides of the GaAs field emitter were characterized using scanning electron microscopy (SEM). The emission current characteristics of the emitter was measured using a diode configuration in a vacuum of 4 times 10-6 Pa. The apparatus for measuring photo-response experiments was also presented
Keywords :
III-V semiconductors; field emitter arrays; gallium arsenide; scanning electron microscopy; GaAs; GaAs field emitters; SEM; apparatus; emission current characteristics; photoresponse experiments; scanning electron microscopy; Biomembranes; Cathodes; Electron beams; Electron emission; Etching; Fabrication; Gallium arsenide; Optical modulation; Photonic band gap; Pulse modulation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location :
Guilin
Print_ISBN :
1-4244-0401-0
Type :
conf
DOI :
10.1109/IVNC.2006.335481
Filename :
4134583
Link To Document :
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