DocumentCode :
2043620
Title :
Dislocation configurations in strained single-heterostructure layers
Author :
Madebo, M. ; Usher, B.F.
Author_Institution :
Dept. of Electron. Eng., La Trobe Univ., Bundoora, Vic., Australia
fYear :
2000
fDate :
2000
Firstpage :
471
Lastpage :
474
Abstract :
Detailed force-balance considerations can lead to a description of the dislocation configuration within a strained layer. Dislocation configurations are of interest because critical thicknesses of epitaxially grown layers depend on the evolution of the configuration of threading dislocations. Moreover, it promises to shed light on investigations of critical thickness criteria for Multiple Quantum Well (MQW) structures. This paper reports a theoretical study of dislocation configurations in structures by examining the forces acting on a dislocation segment and developing governing equations to describe the equilibrium structure as a function of layer strain and thickness.
Keywords :
dislocations; semiconductor epitaxial layers; semiconductor heterojunctions; semiconductor quantum wells; critical thickness; dislocation configuration; equilibrium structure; force balance model; multiple quantum well structures; strained single-heterostructure layers; threading dislocations; Atmosphere; Capacitive sensors; Equations; Geometry; III-V semiconductor materials; Iron; Shape; Stress; Surface tension; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
Print_ISBN :
0-7803-6698-0
Type :
conf
DOI :
10.1109/COMMAD.2000.1022992
Filename :
1022992
Link To Document :
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