Title :
Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas
Author :
Kamataki, Kunihiro ; Miyata, Hiroshi ; Koga, Kazunori ; Uchida, Giichiro ; Itagaki, Naho ; Yamashita, Daisuke ; Matsuzaki, Hidefumi ; Shiratani, Masaharu
Author_Institution :
Center for Res. & Advancement in Higher Educ., Kyushu Univ., Fukuoka, Japan
Abstract :
We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.
Keywords :
amplitude modulation; high-frequency discharges; nanofabrication; nanoparticles; plasma CVD; plasma fluctuations; amplitude modulation; fluctuation level; harmonic mode; nanoparticle growth; peak-to-peak rf voltage; plasma CVD; plasma fluctuations; plasma parameters; reactive plasmas; rf discharge voltage; amplitude modulation; fluctuations in reactive plasma; nano-particles;
Conference_Titel :
TENCON 2010 - 2010 IEEE Region 10 Conference
Conference_Location :
Fukuoka
Print_ISBN :
978-1-4244-6889-8
DOI :
10.1109/TENCON.2010.5686456
