Title :
The magnetic reversal study of permalloy micro domains
Author :
Huang, Y.W. ; Lo, C.K. ; Yao, Y.D. ; Jeng, T.R. ; Ju, J.J.
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fDate :
March 30 2003-April 3 2003
Abstract :
In this work we using e-beam lithography to define a sub micron magnetic cell with different shape one a metal line which can pass current through it, MFM was employed to observe the magnetization reversal at remanent state and the "writing" process. An array of nine cells were seated on the current line, and the uniformity and proximity of the field produced by current can also be studied.
Keywords :
Permalloy; ferromagnetic materials; magnetic domains; magnetic force microscopy; magnetic thin films; magnetisation reversal; micromagnetics; remanence; FeNi; MFM; e-beam lithography; magnetization reversal; permalloy microdomains; remanent state; sub micron magnetic cell; Coercive force; Gold; Insulation; Lithography; Magnetic domains; Magnetic force microscopy; Magnetic forces; Magnetization; Shape; Strips;
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
DOI :
10.1109/INTMAG.2003.1230601
