Title :
Large-numerical-aperture Microlenses By One-step Ion-beam Etching And Mass-transport Smoothing
Author :
Liau, Z.L. ; Mull, D.E. ; Dennis, C.L. ; Waarts, R.G.
Author_Institution :
Massachusetts Institute of Technology Lexington, MA 02173-9108
Keywords :
Etching; Laboratories; Lenses; Lithography; Microoptics; Optical arrays; Optical distortion; Optical interferometry; Smoothing methods; Substrates;
Conference_Titel :
LEOS '92, Conference Proceedings. IEEE Lasers and Electro-Optics Society, 1992 Annual Meeting
Print_ISBN :
0-7803-0526-4
DOI :
10.1109/LEOS.1992.694165
