DocumentCode
2052397
Title
A simulation study of the bit interference effects in an ultra-thin-body, double-gate, trapped-charge-storage type non-volatile memory cell
Author
Tsai, Wen Jer ; Ou, T.F. ; Huang, J.S. ; Lu, T.C. ; Chen, K.C. ; Chih-Yuan Lu
Author_Institution
Macronix Int. Co., Ltd., Hsinchu
fYear
2008
fDate
April 27 2008-May 1 2008
Firstpage
697
Lastpage
698
Abstract
Bit interference effects in an ultra-thin body, double-gate, trapped-charge-storage type non-volatile memory cell are investigated through two-dimensional device simulations. Though such device is more scalable and has a larger current drive, it is found that the bit states on the two sides of the ldquocommonrdquo body would interact with each other if the body is too thin. The remote charge effect, the remote punch-through effect, and the suppressed read-through capability are clarified to be the major killing factors. If there is a higher intrinsic-Vt along the cellpsilas channel beyond the active thin-body regions, part of the created memory window will be shadowed. Such interferences would become the worst as these cells are arranged in an array having the common-gate feature.
Keywords
integrated circuit modelling; integrated memory circuits; random-access storage; read-only storage; bit interference effects; double-gate nonvolatile memory cell; remote charge effect; remote punch-through effect; suppressed read-through capability; trapped-charge-storage type nonvolatile memory cell; two-dimensional device simulations; ultrathin body nonvolatile memory cell; Costs; Explosives; Flash memory; Interference; Manufacturing; Medical simulation; Nonvolatile memory; Shadow mapping; User-generated content; Voltage; Vt shadowing effect; double-gate; interference; non-volatile memory cell; remote bit effect; remote punchthrough effect; second-bit effect; ultra-thin body;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
Conference_Location
Phoenix, AZ
Print_ISBN
978-1-4244-2049-0
Electronic_ISBN
978-1-4244-2050-6
Type
conf
DOI
10.1109/RELPHY.2008.4558994
Filename
4558994
Link To Document