• DocumentCode
    2052397
  • Title

    A simulation study of the bit interference effects in an ultra-thin-body, double-gate, trapped-charge-storage type non-volatile memory cell

  • Author

    Tsai, Wen Jer ; Ou, T.F. ; Huang, J.S. ; Lu, T.C. ; Chen, K.C. ; Chih-Yuan Lu

  • Author_Institution
    Macronix Int. Co., Ltd., Hsinchu
  • fYear
    2008
  • fDate
    April 27 2008-May 1 2008
  • Firstpage
    697
  • Lastpage
    698
  • Abstract
    Bit interference effects in an ultra-thin body, double-gate, trapped-charge-storage type non-volatile memory cell are investigated through two-dimensional device simulations. Though such device is more scalable and has a larger current drive, it is found that the bit states on the two sides of the ldquocommonrdquo body would interact with each other if the body is too thin. The remote charge effect, the remote punch-through effect, and the suppressed read-through capability are clarified to be the major killing factors. If there is a higher intrinsic-Vt along the cellpsilas channel beyond the active thin-body regions, part of the created memory window will be shadowed. Such interferences would become the worst as these cells are arranged in an array having the common-gate feature.
  • Keywords
    integrated circuit modelling; integrated memory circuits; random-access storage; read-only storage; bit interference effects; double-gate nonvolatile memory cell; remote charge effect; remote punch-through effect; suppressed read-through capability; trapped-charge-storage type nonvolatile memory cell; two-dimensional device simulations; ultrathin body nonvolatile memory cell; Costs; Explosives; Flash memory; Interference; Manufacturing; Medical simulation; Nonvolatile memory; Shadow mapping; User-generated content; Voltage; Vt shadowing effect; double-gate; interference; non-volatile memory cell; remote bit effect; remote punchthrough effect; second-bit effect; ultra-thin body;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
  • Conference_Location
    Phoenix, AZ
  • Print_ISBN
    978-1-4244-2049-0
  • Electronic_ISBN
    978-1-4244-2050-6
  • Type

    conf

  • DOI
    10.1109/RELPHY.2008.4558994
  • Filename
    4558994