Title :
Sub-milli-Torr magnetron sputter deposition of magnetic thin films
Author :
Mao, M. ; Wang, J. ; Lee, C.-L. ; Devasahayam, A. ; Kools, J. ; Rook, K. ; Schneider, T. ; Lam, K.
Author_Institution :
Veeco Instrum. Fremont, CA, USA
fDate :
March 30 2003-April 3 2003
Abstract :
In this paper, we evaluate the single films stress of various component layers in spin-valve or magnetic tunnel junction multilayers and the magnetic thickness loss due to interlayer atomic mixing in the magnetic thin films deposited by sub-milli-Torr magnetron sputtering with that from ion beam sputtering.
Keywords :
aluminium; chromium alloys; cobalt alloys; ferromagnetic materials; internal stresses; iron alloys; magnetic multilayers; magnetic thin films; magnetic tunnelling; manganese alloys; metallic superlattices; metallic thin films; nickel alloys; platinum alloys; ruthenium; spin valves; sputter deposition; tantalum; Al; Cu; Ru; Ta; films stress; interlayer atomic mixing; ion beam sputtering; magnetic thin films; magnetic tunnel junction multilayers; spin-valve; submilliTorr magnetron sputter deposition; Artificial intelligence; Atherosclerosis; Continuous wavelet transforms; Ion beams; Magnetic films; Magnetic flux; Magnetic losses; Saturation magnetization; Sputtering; Tensile stress;
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
DOI :
10.1109/INTMAG.2003.1230739
