DocumentCode
2054885
Title
Study of MR in Fe/sub 3/O/sub 4/ tunnel junctions
Author
Park, C. ; Yiming Shi ; Peng, Y. ; Barmak, Katayun ; White, R.M.
Author_Institution
Dept. of Mater. Sci. & Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear
2003
fDate
March 30 2003-April 3 2003
Abstract
In this paper, we examined the magnetic and structural properties of Fe/sub 3/O/sub 4/ films fabricated by using reactive sputtering as an electrode in a MTJ. We investigated the interface of the MTJ using high resolution transmission electron microscopy.
Keywords
coercive force; ferrites; magnetic hysteresis; magnetic thin films; sputtered coatings; transmission electron microscopy; tunnelling magnetoresistance; Fe/sub 3/O/sub 4/; Fe/sub 3/O/sub 4/ films; HRTEM; MR; magnetic properties; magnetic tunnel junction; reactive sputtering; transmission electron microscopy; Annealing; Artificial intelligence; Coercive force; Iron; Magnetic devices; Magnetic hysteresis; Magnetic materials; Magnetic tunneling; Polarization; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7647-1
Type
conf
DOI
10.1109/INTMAG.2003.1230804
Filename
1230804
Link To Document